30 dagars returrätt
Snabba leveranser
Personlig kontakt
• Activation of surface bonds • Instant-On source for Vacuum UV radiation; no warm-up phase
• Adjustment of wetting angle • Monochromatic light source for Xenon excimer
• Cleaning of photo masks radiation at 172 nm (FWHM14nm)
• Removal of organic residue • No UV-A, No UV-B radiation
• Matting of acrylic lacquers without matting agent • Patented pulse mode operation for high conversion
• Removal of photoresist • Photo induced etching (e.g. Teflon) efficiency of about 40%
• Photo induced CVD at lower process temperature • Light weight
• Photocatalytic processes in advanced wafer processing • No cooling required
• Removal of organic toxins in water • Nitrogen purging required
• Lacquer hardening without Photoinitiator • No limitations on switching cycles
• Photo induced surface oxidation • Capable of instant restrike with no detriment to
• Surface treatment for improved adhesion lamp life
• Increased pump speed for vacuum systems • Lamp life: 2500 hrs
• Different lengths available
• Two versions for use in vacuum available
• Made in Germany